Description

Tetra(dimethylamino) titanium is a chemical compound with the formula Ti(NMe2)4. It is a coordination complex of titanium with four dimethylamino ligands. This compound is commonly used as a precursor for the deposition of titanium-containing thin films in various applications, including semiconductor devices and solar cells.

In the context of thin film deposition, tetra(dimethylamino)titanium can be used in chemical vapor deposition (CVD) or atomic layer deposition (ALD) processes. In CVD, the compound is vaporized and then reacts with a suitable precursor gas to form a solid film on a substrate. In ALD, the compound is sequentially reacted with other precursors in a self-limiting manner to form a thin film with precise control over its thickness and composition.

Overall, tetra(dimethylamino)titanium is an important compound in the field of materials science and is widely used in the fabrication of thin films for various electronic and optoelectronic devices.